Product Description
Precision 0–80 LPM Gas Mass Flow Controller for Process & Vacuum Equipment
The Series GFC Model GFC-1141 Gas Mass Flow Controller delivers tight regulation across the 0–80 L/min range, making it ideal for pilot manufacturing skids, glass-coating tools, analytical gas delivery panels, and controlled vacuum processes.
A straight-tube thermal sensor combined with internal flow restriction reduces sensitivity to supply fluctuations, while onboard PID electronics continuously modulate the electromagnetic valve to maintain commanded flow. Dual analog outputs simplify PLC integration for automated process lines and research systems alike.
Each unit includes a NIST-traceable calibration certificate, supporting regulated production, ISO programs, and quality-driven laboratories.
Gas Flow Controller Specifications – Model GFC-1141
• Flow Range: 0–80 LPM (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 s to ±2% of setpoint
• Pressure Rating: Up to 1000 psig (500 psig for select models)
• Outputs: 0–5 VDC and 4–20 mA
• Power: ±12 VDC
• Display: 3-1/2-digit tilting LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Parts: Aluminum, brass, 316 SS, fluoroelastomer O-rings
• Max Particle Size: 5 microns
• Temp Limits: 32–122°F (0–50°C)
Typical Applications
• Thin-film deposition systems
• Vacuum process tools
• Pilot production skids
• Analytical gas delivery panels
• Glass-coating equipment
• R&D laboratories
Why Engineers Select the GFC-1141
✔ Optimized for mid-low flow precision
✔ PID-driven valve control
✔ PLC-ready outputs
✔ High-pressure capability
✔ NIST-traceable certificate included
✔ Compact, panel-ready design
