Product Description
Precision 0–60 LPM Gas Mass Flow Controller for Process & Vacuum Systems
The Series GFC Model GFC-1140 Gas Mass Flow Controller provides accurate closed-loop control across the 0–60 L/min range, making it an ideal choice for thin-film coating systems, pilot production skids, analytical gas panels, and vacuum-driven manufacturing tools.
Its straight-tube thermal sensor design minimizes sensitivity to supply pressure changes, while integrated PID electronics continuously modulate the internal electromagnetic valve to hold commanded flow rates. Dual analog outputs allow seamless PLC or DCS integration in automated process environments.
Every unit ships with a NIST-traceable calibration certificate, supporting ISO programs, regulated production lines, and research facilities where documentation matters.
Gas Flow Controller Specifications – Model GFC-1140
• Flow Range: 0–60 LPM (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 s to ±2% of setpoint
• Pressure Rating: Up to 1000 psig (500 psig for select models)
• Outputs: 0–5 VDC and 4–20 mA
• Power: ±12 VDC
• Display: 3-1/2-digit tilting LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Aluminum, brass, 316 SS, fluoroelastomer O-rings
• Max Particle Size: 5 microns
• Temp Limits: 32–122°F (0–50°C)
Typical Applications
• Thin-film deposition systems
• Vacuum process tools
• Pilot production skids
• Analytical gas delivery panels
• Glass-coating equipment
• R&D laboratories
Why Engineers Select the GFC-1140
✔ Optimized for mid-range flow precision
✔ PID-driven electromagnetic valve
✔ PLC-ready analog outputs
✔ High-pressure capability
✔ NIST-traceable calibration included
✔ Compact, panel-mount design
