Product Description
0–500 mL/min Gas Mass Flow Controller for Laboratory-Scale Processes
The Series GFC Model GFC-1106 Gas Mass Flow Controller delivers stable milliliter-level gas control up to 500 mL/min, making it ideal for analytical instruments, pilot reactors, vacuum chambers, and thin-film deposition systems requiring highly repeatable dosing.
Using a straight-tube thermal sensor and PID-regulated electromagnetic valve, the GFC-1106 automatically compensates for temperature and pressure changes to maintain the programmed flow rate. Dual analog outputs integrate easily with PLCs, controllers, and data-acquisition systems, while the tilting LCD simplifies local setup and verification.
Each unit ships with a NIST-traceable calibration certificate, supporting regulatory documentation, quality programs, and R&D environments where defensible flow accuracy is essential.
Technical Specifications — GFC-1106
• Flow Range: 0–500 mL/min (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 s to ±2% of setpoint
• Pressure Rating: Up to 1000 psig (500 psig for select models)
• Outputs: 0–5 VDC and 4–20 mA
• Power: ±12 VDC
• Display: 3-1/2-digit tilting LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Aluminum, brass, 316 SS, fluoroelastomer
• Max Particle Size: 5 microns
• Temperature Limits: 32–122°F (0–50°C)
Typical Applications
• Analytical gas dosing systems
• Research laboratories
• Pilot-scale reactors
• Vacuum process tools
• Thin-film deposition
• Glass-coating lines
Why Engineers Choose the GFC-1106
✔ Optimized for micro-flow gas metering
✔ PID-controlled electromagnetic valve
✔ PLC-ready analog outputs
✔ NIST-traceable calibration included
✔ High-pressure rated construction
✔ Compact industrial enclosure
