Product Description
Ultra-Low-Flow Gas Mass Flow Controller for Trace Applications
The Series GFC Model GFC-1103 Gas Mass Flow Controller is engineered for precise gas delivery below 50 mL/min, making it an ideal solution for analytical systems, pilot reactors, semiconductor tooling, leak detection rigs, and thin-film deposition processes.
Using a straight-tube thermal sensor paired with PID-driven electromagnetic valve control, the GFC-1103 automatically compensates for temperature and pressure fluctuations to hold programmed flow setpoints with exceptional stability. Dual analog outputs simplify integration into PLC panels, vacuum skids, and automated test stands, while the tilting LCD display improves readability in compact lab environments.
Each unit is factory calibrated and supplied with a NIST-traceable certificate, supporting regulated production environments, quality assurance programs, and research documentation.
Technical Specifications — GFC-1103
• Flow Range: 0–50 mL/min (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 s to ±2% of setpoint
• Pressure Rating: Up to 1000 psig (500 psig for select models)
• Outputs: 0–5 VDC and 4–20 mA
• Power Supply: ±12 VDC
• Display: 3-1/2-digit tilting LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Aluminum, brass, 316 SS, fluoroelastomer
• Max Particle Size: 5 microns
• Operating Temperature: 32–122°F (0–50°C)
Typical Applications
• Trace-gas metering
• Gas chromatography feed lines
• Leak-testing stations
• Vacuum chambers
• Pilot reactors
• Thin-film coating systems
Why Engineers Choose the GFC-1103
✔ Designed specifically for micro-flow regulation
✔ Stable PID-controlled electromagnetic valve
✔ PLC-ready analog outputs
✔ NIST-traceable calibration included
✔ High-pressure capable body
✔ Compact for lab benches and OEM panels
