Product Description
Ultra-Low-Flow Gas Mass Flow Controller for Analytical Processes
The Series GFC Model GFC-2103 Gas Mass Flow Controller is designed for precision gas delivery up to 50 mL/min, supporting applications that require highly stable micro-flow regulation such as surface coating systems, research reactors, leak testing rigs, and vacuum process skids.
Its straight-tube thermal sensor and restrictor element minimize the effects of inlet pressure changes, while integrated PID electronics continuously modulate the electromagnetic valve to hold setpoints under dynamic process conditions. Dual analog outputs provide easy integration into automation platforms and laboratory control systems.
Gas Flow Control Specifications – Model GFC-2103
• Flow Range: 0–50 mL/min (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 seconds to ±2% of setpoint
• Maximum Pressure: 1000 psig (500 psig for select models)
• Output Signals: 0–5 VDC and 4–20 mA
• Power Supply: ±12 VDC
• Display: 3-1/2-digit, 90° tiltable LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Anodized aluminum, brass, 316 SS, fluoroelastomer O-rings
• Temperature Limits: 32–122°F (0–50°C)
• Maximum Particle Size: 5 microns
Process Applications
• Micro-reactor systems
• Thin-film deposition tools
• Analytical instrumentation
• Vacuum processing equipment
• Semiconductor R&D platforms
• Precision gas blending
• Laboratory automation skids
Why Engineers Specify the GFC-2103
✔ Stable sub-100 mL/min regulation
✔ PID-controlled electromagnetic valve
✔ Automation-ready analog outputs
✔ High-pressure rated construction
✔ Local LCD flow verification
✔ Supplied with NIST-traceable calibration certificate
