Product Description
0–50 LPM Gas Mass Flow Controller for Industrial Process Control
The Series GFC Model GFC-1133 Gas Mass Flow Controller delivers precise closed-loop control in the 0–50 L/min range, making it ideal for production skids, coating chambers, analytical gas panels, and vacuum-driven manufacturing systems.
Its straight-tube thermal sensor minimizes the effects of upstream pressure variation, while integrated PID electronics continuously regulate the electromagnetic valve to maintain commanded flow rates. Dual analog outputs allow easy PLC integration for automated process lines.
Each unit includes a NIST-traceable calibration certificate, supporting ISO documentation, semiconductor production, and regulated manufacturing environments.
Technical Specifications — GFC-1133
• Flow Range: 0–50 LPM (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 s to ±2% of setpoint
• Pressure Rating: Up to 1000 psig (500 psig for select models)
• Outputs: 0–5 VDC and 4–20 mA
• Power: ±12 VDC
• Display: 3-1/2-digit tilting LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Aluminum, brass, 316 SS, fluoroelastomer
• Max Particle Size: 5 microns
• Temp Limits: 32–122°F (0–50°C)
Typical Applications
• Process gas skids
• Thin-film deposition tools
• Vacuum systems
• Glass-coating lines
• Analytical instrumentation
• R&D laboratories
Why Engineers Choose the GFC-1133
✔ Tuned for mid-range flow precision
✔ PID-controlled electromagnetic valve
✔ PLC-ready outputs
✔ High-pressure capability
✔ NIST calibration included
✔ Rugged industrial construction
