Product Description
0–5 LPM Gas Mass Flow Controller for Ultra-Fine Process Regulation
The Series GFC Model GFC-1109 Gas Mass Flow Controller is engineered for tight low-range control up to 5 L/min, making it an ideal choice for analytical instrumentation, thin-film coating tools, pilot reactors, and vacuum-driven processes where micro-adjustments directly impact product quality.
Its straight-tube thermal sensor works with PID-driven electromagnetic valve technology to maintain stable flow despite pressure fluctuations or process drift. Dual analog outputs enable seamless PLC and SCADA integration, while the tilting LCD simplifies local setpoint verification during commissioning and maintenance.
Each unit ships with a NIST-traceable calibration certificate, supporting regulated manufacturing environments, QA programs, and laboratory compliance.
Technical Specifications — GFC-1109
• Flow Range: 0–5 LPM (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 s to ±2% of setpoint
• Pressure Rating: Up to 1000 psig (500 psig for select models)
• Outputs: 0–5 VDC and 4–20 mA
• Power: ±12 VDC
• Display: 3-1/2-digit tilting LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Aluminum, brass, 316 SS, fluoroelastomer
• Max Particle Size: 5 microns
• Temperature Limits: 32–122°F (0–50°C)
Typical Applications
• Analytical gas delivery panels
• Vacuum process chambers
• Thin-film coating systems
• Research laboratories
• Pilot-scale reactors
• Glass-coating lines
Why Engineers Specify the GFC-1109
✔ Optimized for ultra-low flow control
✔ PID-regulated electromagnetic valve
✔ PLC-ready analog outputs
✔ NIST-traceable calibration
✔ High-pressure rated architecture
✔ Compact, panel-mount form factor
