Product Description
0–40 LPM Gas Mass Flow Controller for Controlled Industrial Processes
The Series GFC Model GFC-1132 Gas Mass Flow Controller is engineered for tight mid-range flow control up to 40 L/min, making it ideal for coating systems, analytical skids, and vacuum-driven manufacturing where stable gas delivery directly impacts yield.
Its straight-tube thermal sensor minimizes sensitivity to pressure variation, while onboard PID electronics continuously adjust the electromagnetic valve to maintain commanded flow rates in automated systems. Dual analog outputs simplify PLC integration and remote control.
Every unit ships with a NIST-traceable calibration certificate, supporting quality systems, semiconductor tooling, and regulated industrial operations.
Technical Specifications — GFC-1132
• Flow Range: 0–40 LPM (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 s to ±2% of setpoint
• Pressure Rating: Up to 1000 psig (500 psig for select models)
• Outputs: 0–5 VDC and 4–20 mA
• Power: ±12 VDC
• Display: 3-1/2-digit tilting LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Aluminum, brass, 316 SS, fluoroelastomer
• Max Particle Size: 5 microns
• Temp Limits: 32–122°F (0–50°C)
Typical Applications
• Thin-film coating tools
• Vacuum process systems
• Analytical gas panels
• Semiconductor support equipment
• Glass-coating lines
• Research laboratories
Why Engineers Choose the GFC-1132
✔ Optimized for tighter mid-range flow bands
✔ PID-controlled electromagnetic valve
✔ PLC-ready outputs
✔ High-pressure compatibility
✔ NIST-traceable calibration included
✔ Compact industrial footprint
