Product Description
Ultra-Low Flow Gas Mass Flow Controller for Critical Process Systems
The Series GFC Model GFC-2131 Gas Mass Flow Controller is designed for applications requiring exceptionally stable gas delivery at flow rates up to 30 LPM. By combining a straight-tube thermal sensor with a precision restrictor element, this controller maintains repeatable output even when inlet pressure or temperature changes.
Built for integration into automated equipment, the GFC-2131 supports standard analog control signals and features a tiltable LCD for local verification — making it ideal for laboratory manifolds, thin-film deposition tools, and vacuum process lines.
Gas Flow Control Specifications – Model GFC-2131
• Flow Range: 0–30 LPM (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select X143–X145 models)
• Repeatability: ±0.5% FS
• Response Time: 2 seconds to ±2% of setpoint
• Maximum Pressure: 1000 psig (500 psig for select models)
• Output Signals: 0–5 VDC and 4–20 mA
• Power Supply: ±12 VDC
• Display: 3-1/2-digit, 90° tiltable LCD
• Leak Integrity: 1 × 10⁻⁹ sccs helium
• Wetted Materials: Anodized aluminum, brass, 316 SS, fluoroelastomer O-rings
• Temperature Limits: 32 to 122°F (0 to 50°C)
• Maximum Particle Size: 5 microns
Process Applications
• Precision gas flow control
• Vacuum process equipment
• Thin-film coating systems
• Glass and metal deposition
• Semiconductor R&D tools
• Pilot-scale gas delivery skids
• Pump and valve operation
Why Engineers Choose the GFC-2131
✔ Maintains ultra-stable low-flow setpoints using PID electronics
✔ Compensates for pressure and temperature fluctuations
✔ Interfaces with automation platforms
✔ Local digital flow readout
✔ Compatible with GFT2 flow totalizers
✔ Includes NIST-traceable calibration certificate
Lead Time
Typical manufacturing lead time: 3–4 weeks
