Product Description
0–30 LPM Gas Mass Flow Controller for Precision Process Control
The Series GFC Model GFC-1131 Gas Mass Flow Controller delivers high-stability regulation across lower flow bands up to 30 L/min, making it a strong fit for analytical skids, coating chambers, and pilot-scale manufacturing lines where consistent gas delivery protects process repeatability.
Its straight-tube thermal sensor and internal PID loop continuously adjust the electromagnetic valve to offset pressure fluctuations, while dual analog outputs allow seamless PLC and data-acquisition integration.
Each controller ships with a NIST-traceable calibration certificate, supporting compliance-driven environments and ISO-aligned quality programs.
Technical Specifications — GFC-1131
• Flow Range: 0–30 LPM (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 s to ±2% of setpoint
• Pressure Rating: Up to 1000 psig (500 psig for select models)
• Outputs: 0–5 VDC and 4–20 mA
• Power: ±12 VDC
• Display: 3-1/2-digit tilting LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Aluminum, brass, 316 SS, fluoroelastomer
• Max Particle Size: 5 microns
• Temp Limits: 32–122°F (0–50°C)
Typical Applications
• Analytical gas panels
• Pilot process skids
• Thin-film deposition
• Vacuum chambers
• Research laboratories
• Glass-coating systems
Why Engineers Choose the GFC-1131
✔ Optimized for lower flow ranges
✔ PID-controlled electromagnetic valve
✔ PLC-ready outputs
✔ NIST-traceable calibration
✔ High-pressure capability
✔ Compact panel-mount design
