Product Description
0–200 mL/min Gas Mass Flow Controller for Precision Dosing Systems
The Series GFC Model GFC-1105 Gas Mass Flow Controller is engineered for sub-200 mL/min applications where even minor flow drift impacts process quality. It is well-suited for analytical instrumentation, pilot reactors, leak testing stations, and thin-film coating equipment requiring tight metering and documented calibration.
A straight-tube thermal sensor combined with PID-driven electromagnetic valve technology automatically compensates for temperature and pressure fluctuations, maintaining the programmed flow rate with excellent repeatability. Dual analog outputs simplify integration into PLCs, test stands, and process controllers, while the angled LCD allows fast on-site setup and verification.
Every GFC-1105 ships with a NIST-traceable calibration certificate, supporting regulated manufacturing environments, laboratory QA programs, and R&D validation workflows.
Technical Specifications — GFC-1105
• Flow Range: 0–200 mL/min (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 s to ±2% of setpoint
• Pressure Rating: Up to 1000 psig (500 psig for select models)
• Outputs: 0–5 VDC and 4–20 mA
• Power: ±12 VDC
• Display: 3-1/2-digit tilting LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Aluminum, brass, 316 SS, fluoroelastomer
• Max Particle Size: 5 microns
• Temperature Limits: 32–122°F (0–50°C)
Typical Applications
• Analytical gas dosing
• Leak testing systems
• Pilot-scale reactors
• Vacuum chambers
• Thin-film deposition
• Precision coating lines
Why Engineers Select the GFC-1105
✔ Optimized for ultra-low gas flow control
✔ PID-regulated electromagnetic valve
✔ PLC-ready analog signals
✔ NIST-traceable calibration included
✔ High-pressure rated construction
✔ Compact industrial enclosure
