Product Description
Ultra-Low-Flow Gas Mass Flow Controller for Analytical and Vacuum Systems
The Series GFC Model GFC-2105 Gas Mass Flow Controller delivers high-resolution gas control up to 200 mL/min, making it ideal for analytical instruments, pilot reactors, coating chambers, and vacuum process equipment where stable micro-flows are critical.
A straight-tube thermal sensor paired with a restrictor element minimizes sensitivity to inlet pressure variation, while integrated PID electronics drive the electromagnetic valve to continuously maintain the programmed setpoint. Dual analog outputs simplify integration with PLCs, automation panels, and process skids.
Gas Flow Control Specifications – Model GFC-2105
• Flow Range: 0–200 mL/min (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 seconds to ±2% of setpoint
• Maximum Pressure: 1000 psig (500 psig for select models)
• Output Signals: 0–5 VDC and 4–20 mA
• Power Supply: ±12 VDC
• Display: 3-1/2-digit, 90° tiltable LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Anodized aluminum, brass, 316 SS, fluoroelastomer O-rings
• Temperature Limits: 32–122°F (0–50°C)
• Maximum Particle Size: 5 microns
Process Applications
• Gas chromatography systems
• Thin-film coating chambers
• Pilot-scale reactors
• Semiconductor research tools
• Vacuum process skids
• Laboratory automation
• Precision gas blending
Why Engineers Specify the GFC-2105
✔ Maintains ultra-stable micro-flows
✔ PID-controlled valve regulation
✔ Automation-ready analog outputs
✔ High-pressure rated construction
✔ Tilting LCD for local verification
✔ Supplied with NIST-traceable calibration certificate
