Product Description
Mid-Range Gas Mass Flow Controller for Process Equipment
The Series GFC Model GFC-1143 Gas Mass Flow Controller is engineered for stable, repeatable gas regulation up to 200 L/min, making it an excellent fit for coating chambers, vacuum pump packages, pilot manufacturing skids, and industrial research systems where controlled throughput matters.
A straight-tube thermal sensor paired with a restrictor flow element minimizes sensitivity to upstream pressure changes, while onboard PID electronics continuously modulate the electromagnetic valve to hold setpoints across dynamic operating conditions. Dual analog outputs enable direct PLC or controller integration for automated gas panels and production tooling.
Each controller ships with a NIST-traceable calibration certificate, supporting ISO-driven facilities and regulated manufacturing environments.
Gas Flow Controller Specifications – Model GFC-1143
• Flow Range: 0–200 LPM (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 seconds to ±2% of setpoint
• Maximum Pressure: 1000 psig (500 psig for select models)
• Output Signals: 0–5 VDC and 4–20 mA
• Power Supply: ±12 VDC
• Display: 3-1/2-digit, 90° tiltable LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Anodized aluminum, brass, 316 SS, fluoroelastomer O-rings
• Maximum Particle Size: 5 microns
• Temperature Limits: 32–122°F (0–50°C)
Typical Process Applications
• Gas delivery panels
• Vacuum pump systems
• Thin-film coating tools
• Glass processing equipment
• Pilot manufacturing skids
• Semiconductor R&D tools
• Industrial laboratories
Why Engineers Choose the GFC-1143
✔ Optimized for medium-flow gas control
✔ PID-regulated electromagnetic valve
✔ PLC-ready analog outputs
✔ High-pressure capable design
✔ Tilting LCD for visual verification
✔ NIST-traceable calibration included
