Product Description
Ultra-Low Flow Gas Mass Flow Controller for Micro-Process Systems
The Series GFC Model GFC-2102 Gas Mass Flow Controller is engineered for extreme low-flow gas regulation up to 20 mL/min, making it ideal for analytical instruments, thin-film deposition platforms, leak-test rigs, and laboratory reactor systems.
A straight-tube thermal sensor paired with a precision restrictor minimizes sensitivity to upstream pressure fluctuations, while onboard PID electronics actively adjust the electromagnetic valve to maintain stable delivery across changing process loads. Dual analog outputs simplify integration into PLCs, data acquisition systems, and automated process skids.
Gas Flow Control Specifications – Model GFC-2102
• Flow Range: 0–20 mL/min (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 seconds to ±2% of setpoint
• Maximum Pressure: 1000 psig (500 psig for select models)
• Output Signals: 0–5 VDC and 4–20 mA
• Power Supply: ±12 VDC
• Display: 3-1/2-digit, 90° tiltable LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Anodized aluminum, brass, 316 SS, fluoroelastomer O-rings
• Temperature Limits: 32–122°F (0–50°C)
• Maximum Particle Size: 5 microns
Process Applications
• Micro-reactor systems
• Analytical gas dosing
• Thin-film coating tools
• Semiconductor R&D equipment
• Vacuum process skids
• Precision gas blending
• Instrument calibration benches
Why Engineers Specify the GFC-2102
✔ Designed for trace-level gas control
✔ PID-regulated electromagnetic valve
✔ Automation-ready analog outputs
✔ High-pressure rated body
✔ Local LCD verification
✔ Supplied with NIST-traceable calibration certificate
