Product Description
0–20 LPM Gas Mass Flow Controller for Analytical and Vacuum Processes
The Series GFC Model GFC-1130 Gas Mass Flow Controller is engineered for high-resolution control at lower flow rates up to 20 L/min, supporting research skids, vacuum chambers, and thin-film deposition systems where stability directly impacts product yield.
Its straight-tube thermal sensor and integrated PID electronics continuously compensate for pressure changes while driving the electromagnetic valve for smooth, repeat-able regulation. Dual analog outputs simplify PLC and SCADA integration across automated process lines.
Each unit is supplied with a NIST-traceable calibration certificate, making the GFC-1130 a dependable choice for regulated facilities and quality-driven production environments.
Technical Specifications — GFC-1130
• Flow Range: 0–20 LPM (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 s to ±2% of setpoint
• Pressure Rating: Up to 1000 psig (500 psig for select models)
• Outputs: 0–5 VDC and 4–20 mA
• Power: ±12 VDC
• Display: 3-1/2-digit tilting LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Aluminum, brass, 316 SS, fluoroelastomer
• Max Particle Size: 5 microns
• Temp Limits: 32–122°F (0–50°C)
Typical Applications
• Analytical gas panels
• Vacuum processing systems
• Pilot-scale reactors
• Thin-film deposition
• Research laboratories
• Glass-coating equipment
Why Engineers Choose the GFC-1130
✔ Optimized for low-flow precision control
✔ PID-regulated electromagnetic valve
✔ PLC-ready analog outputs
✔ NIST-traceable calibration
✔ High-pressure capability
✔ Compact panel-mount form factor
