Product Description
Micro-Flow Gas Mass Flow Controller for Research and Precision Processes
The Series GFC Model GFC-2108 Gas Mass Flow Controller is engineered for applications requiring extremely low flow rates up to 2 LPM. A straight-tube thermal sensor combined with a precision restrictor element maintains consistent output despite pressure or temperature changes — making it ideal for laboratory dosing systems, semiconductor research tools, and thin-film deposition equipment.
Automation-ready electronics accept industry-standard analog signals, while the tiltable LCD provides fast verification and adjustment directly at the instrument.
Gas Flow Control Specifications – Model GFC-2108
• Flow Range: 0–2 LPM (N₂ equivalent @ 70 °F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select X143–X145 models)
• Repeatability: ±0.5% FS
• Response Time: 2 seconds to ±2% of setpoint
• Maximum Pressure: 1000 psig (500 psig for select models)
• Output Signals: 0–5 VDC and 4–20 mA
• Power Supply: ±12 VDC
• Display: 3-1/2-digit, 90° tiltable LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Anodized aluminum, brass, 316 SS, fluoroelastomer O-rings
• Temperature Limits: 32–122 °F (0–50 °C)
• Maximum Particle Size: 5 microns
Process Applications
• Micro-dosing gas delivery
• Laboratory research systems
• Vacuum processing equipment
• Thin-film deposition tools
• Glass and metal coating
• Semiconductor development
• Pilot manufacturing skids
Why Engineers Specify the GFC-2108
✔ Maintains ultra-fine flow stability using PID-controlled valves
✔ Compensates for inlet pressure and temperature shifts
✔ Integrates with automation platforms
✔ Local digital flow readout
✔ Works with GFT2 flow totalizers
✔ Includes NIST-traceable calibration certificate
