Product Description
0–2 LPM Gas Mass Flow Controller for Micro-Flow Process Control
The Series GFC Model GFC-1108 Gas Mass Flow Controller is optimized for extremely low-flow applications up to 2 L/min, supporting analytical instruments, vacuum chambers, thin-film deposition tools, and pilot-scale research systems where stable delivery at fractional setpoints is critical.
Its straight-tube thermal sensor is paired with PID-driven electromagnetic valve control to compensate for pressure changes and process disturbances in real time. Dual analog outputs allow direct PLC or SCADA integration, while the tilting LCD display simplifies setup and verification at the panel.
Each controller ships with a NIST-traceable calibration certificate, supporting regulated manufacturing environments, cleanroom operations, and QA programs that demand documented flow accuracy.
Technical Specifications — GFC-1108
• Flow Range: 0–2 LPM (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 s to ±2% of setpoint
• Pressure Rating: Up to 1000 psig (500 psig for select models)
• Outputs: 0–5 VDC and 4–20 mA
• Power: ±12 VDC
• Display: 3-1/2-digit tilting LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Aluminum, brass, 316 SS, fluoroelastomer
• Max Particle Size: 5 microns
• Temperature Limits: 32–122°F (0–50°C)
Typical Applications
• Analytical gas panels
• Vacuum coating chambers
• Semiconductor pilot tools
• Research laboratories
• Glass-coating lines
• Process development skids
Why Engineers Specify the GFC-1108
✔ Designed for micro-flow stability
✔ PID-controlled electromagnetic valve
✔ PLC-ready analog outputs
✔ NIST-traceable calibration
✔ High-pressure capability
✔ Compact, panel-mount format
