Product Description
Ultra-Low-Flow Gas Mass Flow Controller for Critical Process Applications
The Series GFC Model GFC-2111 Gas Mass Flow Controller is engineered for applications that demand extremely stable gas delivery at flow rates up to 15 LPM. Its straight-tube thermal sensor and restrictor-element design maintain accuracy even when inlet pressure or temperature shifts, making it ideal for laboratory manifolds, pilot-scale systems, and thin-film deposition tools.
Automation-ready electronics accept industry-standard analog signals, while a tiltable LCD provides local verification at the point of use—supporting setup, diagnostics, and continuous operation in demanding process environments.
Gas Flow Control Specifications – Model GFC-2111
• Flow Range: 0–15 LPM (N₂ equivalent @ 70 °F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select X143–X145 models)
• Repeatability: ±0.5% FS
• Response Time: 2 seconds to ±2% of setpoint
• Maximum Pressure: 1000 psig (500 psig for select models)
• Output Signals: 0–5 VDC and 4–20 mA
• Power Supply: ±12 VDC
• Display: 3-1/2-digit, 90° tiltable LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Anodized aluminum, brass, 316 SS, fluoroelastomer O-rings
• Temperature Limits: 32 to 122 °F (0 to 50 °C)
• Maximum Particle Size: 5 microns
Process Applications
• Precision gas flow regulation
• Vacuum processing equipment
• Thin-film deposition systems
• Glass and metal coating lines
• Semiconductor R&D
• Pilot-scale gas delivery skids
• Pump and valve actuation
Why Engineers Choose the GFC-2111
✔ Maintains ultra-stable low-flow setpoints using PID control
✔ Minimizes temperature- and pressure-driven drift
✔ Interfaces with automation platforms
✔ Local digital flow readout in engineering units
✔ Compatible with GFT2 flow totalizers
✔ Includes NIST-traceable calibration certificate
