Product Description
0–15 LPM Gas Mass Flow Controller for Precision Process Control
The Series GFC Model GFC-1111 Gas Mass Flow Controller delivers ultra-stable regulation at flow rates up to 15 L/min, making it ideal for analytical gas panels, pilot reactors, and thin-film deposition tools where even minor drift can affect yields.
Its straight-tube thermal sensor works in tandem with PID-driven electromagnetic valve control to maintain accurate setpoints through pressure fluctuations and process changes. Dual analog outputs simplify integration with PLC, SCADA, and automated gas distribution systems.
Each unit ships with a NIST-traceable calibration certificate, supporting quality programs and compliance-driven environments.
Technical Specifications — GFC-1111
• Flow Range: 0–15 LPM (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 s to ±2% of setpoint
• Pressure Rating: Up to 1000 psig (500 psig for select models)
• Outputs: 0–5 VDC and 4–20 mA
• Power: ±12 VDC
• Display: 3-1/2-digit tilting LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Aluminum, brass, 316 SS, fluoroelastomer
• Max Particle Size: 5 microns
• Temp Limits: 32–122°F (0–50°C)
Typical Applications
• Analytical gas manifolds
• Vacuum process tools
• Thin-film coating systems
• Research laboratories
• Pilot-scale reactors
• Glass-coating lines
Why Engineers Choose the GFC-1111
✔ Optimized for tight low-flow control
✔ PID-regulated electromagnetic valve
✔ PLC-ready analog outputs
✔ NIST-traceable calibration
✔ High-pressure capable design
✔ Compact panel-mount footprint
