Product Description
High-Capacity Gas Mass Flow Controller for Industrial Process Systems
The Series GFC Model GFC-1145 Gas Mass Flow Controller is built for large-volume gas delivery up to 1000 L/min, supporting demanding manufacturing, coating, vacuum, and materials-processing environments where continuous flow accuracy is mission-critical.
A straight-tube thermal sensor paired with a precision restrictor minimizes sensitivity to upstream pressure variation, while integrated PID electronics drive the electromagnetic valve to maintain stable flow through rapidly changing process loads. Dual analog outputs allow direct PLC or control-system integration for automated production skids and research facilities.
Rated for high pressures and supplied with a NIST-traceable calibration certificate, the GFC-1145 is suited for long-term deployment in industrial gas distribution systems, deposition tools, and pump-driven process lines.
Gas Flow Controller Specifications – Model GFC-1145
• Flow Range: 0–1000 LPM (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 seconds to ±2% of setpoint
• Maximum Pressure: 1000 psig (500 psig for select models)
• Output Signals: 0–5 VDC and 4–20 mA
• Power Supply: ±12 VDC
• Display: 3-1/2-digit, 90° tiltable LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Anodized aluminum, brass, 316 SS, fluoroelastomer O-rings
• Maximum Particle Size: 5 microns
• Temperature Limits: 32–122°F (0–50°C)
High-Flow Process Applications
• Gas distribution systems
• Vacuum pump skids
• Thin-film coating lines
• Glass and metal processing
• Semiconductor manufacturing
• Chemical vapor deposition
• Industrial research labs
Why Engineers Specify the GFC-1145
✔ Designed for high-volume gas throughput
✔ PID-regulated electromagnetic valve
✔ Automation-ready analog outputs
✔ High-pressure rated body
✔ On-device LCD verification
✔ NIST-traceable calibration included
