Product Description
Ultra-Low-Flow Gas Mass Flow Controller for Analytical Systems
The Series GFC Model GFC-1104 Gas Mass Flow Controller is purpose-built for applications requiring precise gas delivery below 100 mL/min. Ideal for analytical instruments, leak-testing stations, pilot-scale reactors, and thin-film deposition equipment, the GFC-1104 delivers stable flow regulation where micro-changes can compromise results.
A straight-tube thermal sensor paired with PID-controlled electromagnetic valve technology automatically compensates for temperature and pressure variation, locking in the programmed setpoint with excellent repeatability. Dual analog outputs allow direct integration into PLCs, vacuum systems, and automated test benches, while the angled LCD enables rapid setup in crowded lab environments.
Each unit ships with a NIST-traceable calibration certificate, supporting regulated manufacturing, QA programs, and R&D documentation requirements.
Technical Specifications — GFC-1104
• Flow Range: 0–100 mL/min (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 s to ±2% of setpoint
• Pressure Rating: Up to 1000 psig (500 psig for select models)
• Outputs: 0–5 VDC and 4–20 mA
• Power: ±12 VDC
• Display: 3-1/2-digit tilting LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Aluminum, brass, 316 SS, fluoroelastomer
• Max Particle Size: 5 microns
• Operating Temp: 32–122°F (0–50°C)
Typical Applications
• Trace-gas metering
• Leak detection systems
• Chromatography instruments
• Vacuum chambers
• Pilot reactors
• Thin-film coating equipment
Why Engineers Choose the GFC-1104
✔ Designed for sub-100 mL/min flow stability
✔ PID-regulated electromagnetic valve
✔ PLC-ready analog outputs
✔ NIST-traceable calibration included
✔ High-pressure rated body
✔ Compact laboratory-friendly footprint
