Product Description
Precision Ultra-Low-Flow Gas Mass Flow Controller for Laboratory Systems
The Series GFC Model GFC-2104 Gas Mass Flow Controller is engineered for micro-scale gas delivery up to 100 mL/min, making it ideal for analytical instrumentation, thin-film deposition, pilot reactors, and vacuum process systems that demand repeatable low-flow control.
A straight-tube thermal sensor paired with a restrictor flow element reduces sensitivity to inlet pressure variation, while integrated PID electronics continuously adjust the electromagnetic valve to maintain stable setpoints. Dual analog outputs allow seamless integration with PLCs, automation platforms, and research skids.
Gas Flow Control Specifications – Model GFC-2104
• Flow Range: 0–100 mL/min (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 seconds to ±2% of setpoint
• Maximum Pressure: 1000 psig (500 psig for select models)
• Output Signals: 0–5 VDC and 4–20 mA
• Power Supply: ±12 VDC
• Display: 3-1/2-digit, 90° tiltable LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Anodized aluminum, brass, 316 SS, fluoroelastomer O-rings
• Temperature Limits: 32–122°F (0–50°C)
• Maximum Particle Size: 5 microns
Process Applications
• Gas chromatography systems
• Thin-film coating tools
• Semiconductor research equipment
• Pilot-scale reactors
• Vacuum processing skids
• Laboratory automation systems
• Precision gas blending
Why Engineers Specify the GFC-2104
✔ Stable micro-flow regulation
✔ PID-driven valve control
✔ Automation-ready outputs
✔ High-pressure rated construction
✔ Local LCD verification
✔ Supplied with NIST-traceable calibration certificate
