Product Description
Precision 0–100 LPM Gas Mass Flow Controller for Automated Process Systems
The Series GFC Model GFC-1142 Gas Mass Flow Controller is engineered for tight regulation in the 0–100 L/min range, making it ideal for thin-film deposition systems, pilot manufacturing skids, analytical gas delivery panels, and controlled vacuum equipment.
A straight-tube thermal sensor paired with an internal restrictor minimizes pressure sensitivity while PID electronics continuously modulate the electromagnetic valve to maintain commanded flow under dynamic operating conditions. Dual analog outputs allow seamless PLC integration for automated tooling and process control architectures.
Every unit ships with a NIST-traceable calibration certificate, supporting ISO programs, QA laboratories, and regulated production environments.
Gas Flow Controller Specifications – Model GFC-1142
• Flow Range: 0–100 LPM (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 seconds to ±2% of setpoint
• Maximum Pressure: 1000 psig (500 psig for select models)
• Output Signals: 0–5 VDC and 4–20 mA
• Power Supply: ±12 VDC
• Display: 3-1/2-digit, 90° tiltable LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Anodized aluminum, brass, 316 SS, fluoroelastomer O-rings
• Maximum Particle Size: 5 microns
• Temperature Limits: 32–122°F (0–50°C)
Typical Process Applications
• Thin-film coating equipment
• Vacuum pump packages
• Pilot manufacturing skids
• Analytical gas systems
• Glass processing tools
• Research laboratories
• Semiconductor R&D platforms
Why Engineers Choose the GFC-1142
✔ Optimized for precision mid-range gas delivery
✔ PID-controlled electromagnetic valve
✔ PLC-ready analog outputs
✔ High-pressure capable design
✔ Tilting LCD for rapid verification
✔ NIST-traceable calibration included
