Product Description
Ultra-Low-Range Gas Mass Flow Controller for Analytical and Micro-Process Systems
The Series GFC Model GFC-2101 Gas Mass Flow Controller is engineered for trace-level gas delivery up to 10 mL/min, supporting applications where micro-flow stability directly impacts measurement accuracy, coating uniformity, or reaction control.
A straight-tube thermal sensor works in tandem with a calibrated restrictor to reduce sensitivity to upstream pressure changes, while integrated PID electronics continuously adjust the electromagnetic valve to maintain steady flow across changing process conditions. Dual analog outputs allow seamless PLC integration for automated laboratories, vacuum skids, and semiconductor R&D platforms.
Gas Flow Control Specifications – Model GFC-2101
• Flow Range: 0–10 mL/min (N₂ equivalent @ 70°F, 760 mm Hg)
• Accuracy: ±1% FS (±1.5% FS for select models)
• Repeatability: ±0.5% FS
• Response Time: 2 seconds to ±2% of setpoint
• Maximum Pressure: 1000 psig (500 psig for select models)
• Output Signals: 0–5 VDC and 4–20 mA
• Power Supply: ±12 VDC
• Display: 3-1/2-digit, 90° tiltable LCD
• Leak Integrity: 1 × 10⁻⁹ sccs He
• Wetted Materials: Anodized aluminum, brass, 316 SS, fluoroelastomer O-rings
• Temperature Limits: 32–122°F (0–50°C)
• Maximum Particle Size: 5 microns
Precision Gas Control Applications
• Analytical instrumentation
• Semiconductor R&D tools
• Micro-reactors
• Leak detection systems
• Thin-film deposition
• Vacuum process skids
• Calibration benches
Why Engineers Choose the GFC-2101
✔ Designed for trace-gas dosing
✔ PID-regulated electromagnetic valve
✔ Automation-ready outputs
✔ High-pressure rated body
✔ Local LCD verification
✔ Supplied with NIST-traceable calibration certificate
